NVIDIA achieves a breakthrough in chip manufacturing for ASML, TSMC, and Synopsys
The GTC developer conference by NVIDIA has just concluded, and amidst all the buzz on artificial intelligence (AI), the company unveiled that it has achieved a breakthrough in chip manufacturing. The advance is also welcomed by semiconductor leaders, including ASML, TSMC, and Synopsys, as it brings accelerated computation to the field of computational lithography right as current processes reach the limits of physics. $Taiwan Semiconductor (TSM.US)$ $NVIDIA (NVDA.US)$
The breakthrough brings accelerated computing to computational lithography using NVIDIA’s GPUs, enabling industry leaders mentioned above to accelerate the design and manufacturing of next-generation chips. Known as cuLitho, the new software library promises an exponential acceleration in chip design development times.
cuLitho also reduces chip fab data center carbon footprint and can push the boundaries of bleeding-edge semiconductor design. So far, NVIDIA cuLitho has already been adopted by the world’s top chip foundry, TSMC, leading EDA chip design tools company Synopsys, and chip manufacturing equipment maker ASML.
The idea behind the platform is to offload and parallelize the complex and computationally expensive process of generating photomasks used by lithography machines to etch nanoscale features, like transistors or wires, into silicon wafers.
“With lithography at the limits of physics, NVIDIA’s introduction of cuLitho and collaboration with our partners TSMC, ASML, and Synopsys allows fabs to increase throughput, reduce their carbon footprint, and set the foundation for 2nm and beyond,” Jensen Huang, founder and CEO of NVIDIA, said in his keynote address at the annual GTC developer conference. $Direxion Daily Semiconductor Bull 3x Shares ETF (SOXL.US)$
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