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STATEMENT REGARDING DUTCH GOVERNMENT'S UPDATED EXPORT LICENSE REQUIREMENT

STATEMENT REGARDING DUTCH GOVERNMENT'S UPDATED EXPORT LICENSE REQUIREMENT

关于荷兰政府更新出口许可要求的声明
阿斯麦 ·  09/06 00:00

The Dutch government today published an updated license requirement regarding the export of immersion DUV semiconductor equipment. ASML believes this requirement will harmonize the approach for issuing export licenses.

荷兰政府今天发布了有关浸入式深紫外半导体设备出口的最新许可要求。ASML认为,这一要求将统一发放出口许可证的方法。

As a result of the updated license requirements, and in line with US Export Administration Regulation 734.4.(a).(3), ASML will need to apply for export licenses with the Dutch government rather than the US government for shipments of its TWINSCAN NXT:1970i and 1980i DUV immersion lithography systems. The Dutch export license requirement is already in place for the TWINSCAN NXT:2000i and subsequent DUV immersion systems. Sales of ASML's EUV systems are also subject to license requirements.

由于更新了许可证要求,符合美国出口管理局第734.4号条例。(a). (3),ASML需要向荷兰政府而不是美国政府申请出口许可证,才能运送其TWINSCAN nxt: 1970i和1980i DUV浸入式光刻系统。荷兰对TWINSCAN nxt: 2000i和后续的潜水潜水系统的出口许可证要求已经到位。ASML 的 EUV 系统的销售也受许可要求的约束。

The updated license requirement published by the Dutch government comes into effect from September 7, 2024.

荷兰政府发布的最新许可要求自2024年9月7日起生效。

Since this is a technical change, this announcement is not expected to have any impact on our financial outlook for 2024 or for our longer-term scenarios as communicated during our Investor Day in November 2022.

由于这是一项技术性变化,因此该公告预计不会对我们2024年的财务前景或2022年11月投资者日期间公布的长期情景产生任何影响。

声明:本内容仅用作提供资讯及教育之目的,不构成对任何特定投资或投资策略的推荐或认可。 更多信息
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