STATEMENT REGARDING DUTCH GOVERNMENT'S UPDATED EXPORT LICENSE REQUIREMENT
STATEMENT REGARDING DUTCH GOVERNMENT'S UPDATED EXPORT LICENSE REQUIREMENT
The Dutch government today published an updated license requirement regarding the export of immersion DUV semiconductor equipment. ASML believes this requirement will harmonize the approach for issuing export licenses.
荷蘭政府今天發佈了有關出口浸沒式DUV半導體設備的更新許可要求。ASML認爲這一要求將統一發放出口許可證的方法。
As a result of the updated license requirements, and in line with US Export Administration Regulation 734.4.(a).(3), ASML will need to apply for export licenses with the Dutch government rather than the US government for shipments of its TWINSCAN NXT:1970i and 1980i DUV immersion lithography systems. The Dutch export license requirement is already in place for the TWINSCAN NXT:2000i and subsequent DUV immersion systems. Sales of ASML's EUV systems are also subject to license requirements.
由於更新的許可要求，並符合美國出口管理條例734.4.(a).(3)的規定，ASML將需要向荷蘭政府申請出口許可證，而不是向美國政府申請用於其TWINSCAN NXT:1970i和1980i DUV浸沒式光刻機的出貨。荷蘭的出口許可要求已經適用於TWINSCAN NXT:2000i和隨後的DUV浸沒式光刻機。ASML的EUV系統銷售也受到許可要求的限制。
The updated license requirement published by the Dutch government comes into effect from September 7, 2024.
荷蘭政府發佈的更新許可要求將於2024年9月7日生效。
Since this is a technical change, this announcement is not expected to have any impact on our financial outlook for 2024 or for our longer-term scenarios as communicated during our Investor Day in November 2022.
由於這是一項技術性的變更，預計此公告對我們2024年的財務展望或我們在2022年11月的投資者日上所傳達的長期情景不會產生任何影響。