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拓斯达(300607.SZ):2023年开始研发新一代面向工业应用场景的运动控制器平台,可以与AI大模型深度集成

Guangdong Topstar Technology (300607.SZ) will begin development of a new generation of motion control platform for industrial applications in 2023, which can be deeply integrated with AI models.

Gelonghui Finance ·  Jun 20 05:21

On June 20th, Gelunhui reported that Guangdong Topstar Technology (300607.SZ) stated on the investor interaction platform that the company will start to develop a new generation of motion controller platform for industrial application scenarios from 2023, which can be deeply integrated with AI big models. Recently, the company has cooperated with Guochuang Software for the development of an embedded operating system for the new generation of motion control platform, which is based on the Euler operating system (openEuler). The successful application of domestic embedded operating systems in industrial robot control platforms has been realized. With this embedded operating system, the new generation motion control platform of the company will deeply integrate IT and OT technologies, strengthen the combination of industrial control and AI technology, support various industrial communication protocols, and realize the interaction between the digital world and the physical world of industrial robots in one-stop. AI industrial robots are an important development direction for robots in the future. The company will continue to promote the integration and verification of industrial robots and AI big models, give full play to the company's accumulation in the industrial field, and complete the exploration and landing of AI industrial robots vertical fields with top AI big model companies. In the more standardized industrial fields of scenes, processes, and flows, the combination of industrial robots and AI big models can enhance the autonomous and cognitive abilities of industrial robots, reduce the threshold for the use of industrial robots, and have advantages in landing, applicability, and economy, with a broad future application market.

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