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光刻机(胶)概念8日主力净流出2.86亿元,张江高科、晶方科技居前

JRJ Finance ·  Jul 8 03:37

7月8日,光刻机(胶)概念下跌2.31%,今日主力资金流出2.86亿元,概念股6只上涨,70只下跌。

主力资金净流出居前的分别为张江高科(4202.44万元)、晶方科技(3801.87万元)、大族激光(2607.98万元)、飞凯材料(2464.12万元)、百川股份(2414.84万元)。

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